Products & Technology


Unique Features:

   Innovated in-line , multi-layer chambers, vacuum-in-vacuum systems

   Plasma stabilized within 0.1 seconds with either 13.56 or 40.68 MHz

   The entire CVD processes are under no contamination and super clean environment

   Cassette in, cassette out, wafer load and unload, fully automated without using belt to transfer wafers

   In-line auto-cleaning of wafer carriers integrated with PECVD deposition processes to provide maximum throughout

   Dry Clean: keeps chamber complete clean, no need to open chamber clean with better uptime

   Smaller reactor chamber design, saves special reactive gases usage (only ~1/8 of traditional chamber)


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Copyright © 2020 Ideal Energy (Shanghai) Sunflower Thin Film Equipment Ltd. | Shanghai ICP No.19045897

Address: 8F,Building A1,Lane 2555,Xiupu Road,Pudong,Shanghai
Shanghai Phone: 021-20791515